The first ASML EUV lithography machinepurchased by Rapidus, an advancedsemiconductor foundry in Japan, will arriveat Hokkaido’s Shinkanage Airport in mid.December 2024, which will also becomethe first EuV lithography equipment inJapan. According to the previousstatements of Rapidus executives, thelithography machine is an earlier 0.33NAmodel, rather than the current global totalof less than 10 0.55NA (High NA) model.
